Welcome to the 9th International Symposium on Laser Metrology
LATEST UPATES (as at 23 June 2008)
Final Technical Programme Available
ABOUT THE SYMPOSIUM
With the growing interest in micro and nano-metrology, the scope of laser metrology has extended beyond the visible domain and into the extreme uv and x-ray to the near and far-infra-red regions. At the same time, traditional optical metrology has seen greater advances in system and methods targeting the growing spread of industrial requirements from super-smooth surfaces, hidden and sub-surface metrology, aspheric and micro-lens array inspection.
This symposium thus targets the broad area of Laser and Optical Metrology with applications ranging from macro – micro – nano engineering. Applications in wide ranging engineering disciplines are encourage specifically Aerospace, Automotive and Transport, Medical, Photonics, Manufacturing and Defense. The symposium hopes to attract researchers to discuss new developments, developers to showcase new system and technologies for industrial applications as well as end-users to discuss and compare existing systems as well as propose their requirements for the future. Student participation is especially welcomed and we hope to make this an opportunity for students to discuss not only their research efforts but explore future job prospects.
IMPORTANT DATES
- Abstract Due Date: 29 February 2008
- Review Result Notification: 14 March 2008
- Manuscript Due Date and Author Registration: extended to 1 May 2008
- Early Bird Registration: 1 May 2008
